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Overview

Ag sintering paste is a functional material increasingly adopted for die attach and heat sink attach in automotive power semiconductors due to its high thermal and electrical conductivity, as well as its high heat resistance and resistance to bonding degradation.
Currently, it is common for Ag sintering paste to be applied in a planar manner depending on the size of the chip or package. However, with the higher performance of power semiconductors, there is an increasing demand for optimizing the shape of the bonding area to enhance conductive and heat dissipation properties, as well as for thinning to reduce thermal resistance.
To meet these needs, Musashi Engineering has developed a non-contact micro-dotting dispensing technology for Ag sintering paste that enables diverse shape designs beyond just rectangles.

Ag Sintering Paste Non-contact Micro-dotting

This technology achieves micro-dot formation with a minimum diameter of φ64μm. It can be utilized for dispensing onto micro-areas on substrates and semiconductor packages where conductivity and thermal conductivity are required.

  Volume Dot Diameter Dot Height
Ave. 0.022nL 64μm 12μm
3σ 0.009nL 4.5μm 2.0μm

Ag Sintering Paste 19µm Thin Film Formation

This technology enables the formation of thin films with a thickness of 19μm. Furthermore, by forming shapes through dotting, it is possible to create thin films with increased freedom in bonding area shapes, such as L-shapes or round shapes.

  • Coating method: Continuous coating
  • Average film thickness: 19µm

OTHER CASES
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